Contrast Masking Workshops
designed for 1 to 4 participants,
available throughout the year to fit YOUR schedule.
for 2019 Contrast Masking Workshops
Experience the excitement of Contrast Masking
to achieve remarkable print quality firsthand!
Taught by Lynn Radeka with visits and demonstrations
by masking guru Dr. Dennis McNutt. This informal and enjoyable
workshop will take the "mystique" out of contrast masking.
Fine-tuning your prints to fulfill your visualization will become
an exciting reality as you learn firsthand to make a variety of
valuable and powerful contrast masks effortlessly and quickly,
using inexpensive films and developers. The use of a densitometer
is not needed, as this workshop stresses the use of contrast masking
as an art in itself. The potential for improving your print quality
workshop stresses the making and use of an array of different
contrast masks to improve and enhance black and white print
quality. Lynn Radeka with Ron Gaut, and guest visits by masking-master
Dr. Dennis McNutt, will teach and demonstrate various techniques
of making and using several types of contrast masks such as
the Unsharp Mask, the Contrast Reduction Mask, Shadow Contrast
Increase Masks, Highlight Masks, Dodge Masks and Fog Masks.
Students will view comparison prints showing the profound improvements
that masks can make in actual prints. Using participant's negatives,
as well as Lynn's original negatives, appropriate masks will
be determined and made under Lynn's guidance. Afterwards, participants
will make prints from those masked negatives and discuss the
improvements in print quality. The Precision
pin-registration carrier system in Lynn's enlarger
will be used for all masking and printing demonstrations. Fine-tuning
masks using a variety of techniques including Lynn's highlight-brightener
formula will also be taught and demonstrated.
This intensive and enjoyable workshop,
held in Lynn Radeka's darkroom in southern California, will
be limited to only four participants so that maximum attention
can be given to each individual.
With these exciting tools in the photographer's
arsenal, achieving the "ultimate" fine print will
become an exciting reality instead of an impossible task. We
recommend that all applicants have at least a little basic experience
in Black and White darkroom work. This workshop is primarily
geared toward medium and large format photography but those
shooting small format are welcome as well. All demonstrations
will be given using 4x5 negatives. Participants are encouraged
to bring original negatives in 4x5 format if possible (or 5x7
and 8x10 formats if the participant wishes to learn masking
for contact prints), as well as prints and/or test strips, but
are not required to do so.
Instructors Dr. Dennis McNutt,
Lynn Radeka and Steve Francis
at the October, 2005 workshop. Photo by Roy Pope.
Dr. Dennis McNutt, Chauncey Bayes
and Lynn Radeka
Orange Coast College Contrast Masking demonstration
Lynn has been traveling and photographing
the American West since the late 1960's. He has a number of books
to his credit including Ghost Towns of the Old West, Historic
Towns of America, Forts and Battlefields of the Old West and
Great American Hotels. Lynn was commissioned by Smithmark
Publications in the 1990's to make 8x10 prints from Ansel Adams'
negatives under the ownership of the Library Of Congress for the
large format book Master Of Light: Ansel Adams and His Influences.
He is also featured in the recent book World's Top Photographers:
Landscape. Lynn's black and white work has been published
in books and calendars. Posters of Lynn's photographs have been
displayed and sold in America's National Parks since the mid-1980's.
Lynn is the co-author of the Contrast Masking Kit manual
and has been conducting Contrast Masking Workshops since 2005.
Dennis McNutt has been in the photographic
scene for decades. He is an inventor of all kinds of techniques
and devices and an outstanding photographer often using an 8x10
camera to capture his images in the field. Along with photographer
Mark Jilg, Dennis researched the methods for altering tonal relationships
in the traditional film-based darkroom and wrote the original
articles for three prominent contrast masking techniques: Contrast
Reduction Masks, Highlight Masks and Shadow Contrast Increase
Masks. These remarkable methods have greatly influenced the work
of photographers throughout the world including the other instructors
at this workshop - Aaron Pazanti and Lynn Radeka. Dennis has a
unique ability to explain even the most difficult concepts in
easy to understand ways. We are honored to have Dennis as a guest
speaker at the Contrast Masking Workshops.
Ron Gaut discovered the outdoors at an
early age and developed a deep passion for wilderness and photography.
Not surprising, with Ron's 30-year engineering background and
thirst to learn about photographic processes, in the early 1990's
he began to experiment with many different films, developers,
silver papers and alternative processes. He quantified much of
his work by sensitometric analysis to determine the film/developer
and paper/developer combination properties for different film
and paper development methods, submitting the results as thesis
papers at a local college.
Ron was Influenced in his early work by
Ansel Adams, John Sexton, Lynn Radeka, Ray McSavaney, and other
contemporary "west coast" landscape masters.
Private one-on-one photography
workshops with Lynn Radeka are now available. These popular
workshops offer the beginning, intermediate and advanced photographer
lessons in contrast masking,
zone system or general
photographic techniques and
are designed to suit each individual's interest or level of
experience. Two person workshops may be available at a reduced
hourly cost per person but depend upon availability and scheduling.
Reduced hourly rates may be available if scheduling ten or
more hours. Please call or e-mail for information.
For students and professional
photographers alike, this is the workshop to attend for the
utmost in personal attention. This workshop is tailored to
the individual's experience and the material covered depends
solely on the participants interests. It is the most in-depth
Students may participate
in masking and printing their own negatives in Lynn's darkroom
under his guidance, or may observe Lynn masking and printing
his negatives. Students determine exactly which procedures/processes
they wish to learn, and at what pace they feel most comfortable
with. The Precision Pin-Registration
Carrier System will be demonstrated and used for all
printing and mask-making procedures.
Private Contrast Masking
or Other Darkroom Workshops
Location: Lynn Radeka's darkroom
in southern California
Fee: $100 per hour, with a minimum of 4 hours per session.
Payment required at end of each session or in advance
if you wish..
Hours: Any - depending upon availability. Please schedule
with Lynn in advance.
Materials to bring: Pencil and paper, sample prints (if
desired), original negatives (if desired) in 4x5 format (preferred)
Contact: Lynn Radeka via e-mail
to reserve a space.
For more information on Contrast masking or Precision pin-registration
systems please visit Maskingkits.com
This website is current
and up-to-date as of today,
All photographs on this
site are copyright © Lynn Radeka. All rights reserved. Use without
permission is prohibited.